This article explores systematic approaches to navigating the critical balance between performance and area in high-speed analog layout design. It shows methodologies for efficient debugging of Design Rule Checking (DRC) and Layout Versus Schematic (LVS) violations, which represent fundamental verification steps in the analog design workflow. The article presents structured techniques for prioritizing and resolving verification issues, including hierarchical debugging approaches and automation tools for repetitive checks. Additionally, it gives area optimization strategies such as shared diffusion regions, compact routing methodologies, and strategic use of higher metal layers, while emphasizing techniques to preserve performance through critical path spacing, leveraging layout-dependent effects, and simulation-driven validation. The article addresses how these techniques can be effectively combined to achieve optimal trade-offs between circuit performance and silicon area, with insights into emerging trends and best practices for advanced process nodes
Keywords: DRC/LVS verification, advanced process nodes, analog layout design, area efficiency, performance optimization
